E19500 - SEMI E195 - Test Method Using Adhesive Replacement Substrates to Assess Particulate Surface Contamination on Critical Chamber Components StdTpc-Wafer Shipping System and a specification for glass

and a specification for glass as substrate for semiconductor applications with or without openings has been laid out in SEMI 3D16

The purpose of this Document is to provide guidelines for organosilicate precursors used in Low K CVD processes and to standardize testing procedures to support those requirements

This test method was technically approved by the Global Gases Committee and is the direct responsibility of the North American Gases Committee

By this Standard

E19500 - SEMI E195 - Test Method Using Adhesive Replacement Substrates to Assess Particulate Surface Contamination on Critical Chamber Components StdTpc-Wafer Shipping System and a specification for glass1 Purpose 1. 1 This Test Method describes a quantitative analysis method to measure the ISO 14644 9 surface cleanliness for particle concentration (SCP) of a critical chamber component (CCC) by means of an adhesive replacement substrate (ARS), which removes particles from the CCC surfaces of interest. The ARS is subsequently measured with a scanning surface inspection system (SSIS), typically a scatterometer, for particle counting, and with scanning