Al2O3 - Sapphire Wafer 2" x0.5 mm, A plane (11-20), 1 SP - ALA50D05C1 Glass Substrates High pressure Oxygen-free copper gasket

High pressure Oxygen-free copper gasket for high vacuum sealing of High Pressure Hydro-thermal Reactor 1100°C

67mm  Height = 3

Loading Current: 10A

Surface finish:  One side optical polished

Al2O3 - Sapphire Wafer 2" x0.5 mm, A plane (11-20), 1 SP - ALA50D05C1 Glass Substrates High pressure Oxygen-free copper gasketFeatures: A plane (11 20) sapphire wafer is being used extensively as a substrate for III V nitrides and magnetic epitaxial films due to its better lattice mismatch Wafer size: 2" dia x 0. 4 0. 5 mm thickness Orientaion: A plane (11 20)ori.( + 05o) with Standard Flat Polished surface: Wafer surface is EPI polished via a special CMP procedure Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container Typical