P01500 - SEMI P15 - 原子吸光分光法によるポジティブフォトレジスト・メタルイオンフリー（MIF）現像液中のナトリウムとカリウムの測定 Revision:SEMI P15-92 (Reapproved 1104) - Inactive and followed by counting in

and followed by counting in accordance with the Test Method SEMI MF1810

The front surface of the wafer is mirror polished and the back surface may be as-cut

a guide for material requirements is needed to assure product quality

SEMI M57-0413 (technical revision)

P01500 - SEMI P15 - 原子吸光分光法によるポジティブフォトレジスト・メタルイオンフリー（MIF）現像液中のナトリウムとカリウムの測定 Revision:SEMI P15-92 (Reapproved 1104) - Inactive and followed by counting inNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeNorth American Microlithography Committee2004711North American Regional Standards Committee20049www. semi. org2004111992 NOTICE: This Standard or Safety Guideline has an Inactive Status because the