MF161700 - SEMI MF1617 - Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion Mass Spectrometry StdTpc-Documentation/Training SEMI E154 — Mechanical Interface

SEMI E154 — Mechanical Interface Specification for 450 mm Load Port

the test provides a basis for the reliability evaluation of raw material

It only specifies extensions to existing industry standards when needed to meet the immediate requirements for messaging in a SEMI Standard application context

This Document provides terms and definitions of materials and defects within and on the surface of flat panel display (FPD) substrates and of dimensional

MF161700 - SEMI MF1617 - Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion Mass Spectrometry StdTpc-Documentation/Training SEMI E154 — Mechanical InterfaceNOTICE: This Document was reapproved with minor editorial changes. Secondary ion mass spectrometry (SIMS) can measure on polished silicon wafer product the following: the sodium and potassium areal densities that can affect voltage flatband shifts in integrated circuits, and, the aluminum areal density that can affect the thermal oxide growth rate. the iron areal density that can affect gate oxide integrity, minority carrier lifetime, and current