F01000 - SEMI F10 - フッ素樹脂製チューブフィッティングに損傷を生じさせるのに必要な内部圧力を決定するためのテスト方法 StdTpc-Photolithography Metrology particle measurements performed while the

particle measurements performed while the wafer resides inside the processing chamber) in low-pressure and vacuum applications provides a number of advantages for defect

SEMI S30-1023a (delayed revision)

Subordinate Standards (included):

6 — Particle Specification for Grade 10/0

F01000 - SEMI F10 - フッ素樹脂製チューブフィッティングに損傷を生じさせるのに必要な内部圧力を決定するためのテスト方法 StdTpc-Photolithography Metrology particle measurements performed while theNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. SI