M02000 - SEMI M20 - ウェーハ座標システムの確立の作業方法 Revision:SEMI M20-1110 - Superseded and to allow them to

and to allow them to be easily exchanged

Standardizing INAA for application to silicon will remove differences in the analytical approach and will establish a common reference for the analyses

either a symmetrical five-point or nine-point pattern is used

and 150 mm (6 in

M02000 - SEMI M20 - ウェーハ座標システムの確立の作業方法 Revision:SEMI M20-1110 - Superseded and to allow them toNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI x y xyrq zzx y zr q z x yr q 1 x y z r q z Referenced SEMI Standards (purchase separately) SEMI E5 Specification for SEMI Equipment Communications Standard 2 Message Content (SECS II) SEMI M1 Specification for Polished Single Crystal