E15200 - SEMI E152 - Specification for Mechanical Features of EUV Pod for 150 mm EUVL Reticles StdTpc-Automation Technology Information on the mapping of

Information on the mapping of processing management services to special protocols (e

Where material contains other material (such as carriers containing wafers)

SEMI G18-86 (technical revision)

a particular subset of properties and respective parameters will be considered relevant by the purchaser

E15200 - SEMI E152 - Specification for Mechanical Features of EUV Pod for 150 mm EUVL Reticles StdTpc-Automation Technology Information on the mapping ofThis Standard specifies EUV Pod for the 150 mm Extreme Ultraviolet Lithography (EUVL) reticle, used to ship, transport and store a 6 inch reticle. The EUV Pod consists of an outer pod and a protective inner pod. The EUV Pod is to be used when a conventional reticle carrier does not meet the requirements of EUVL. This Standard is intended to set an appropriate level of specification that places minimal limits on innovation while ensuring modularity and