Aluminum Film on Silicon Wafer, 3 microns / 4" -- Al-Si-100-3um, Si(100) N-type, R:1-20 ohm.cm - FmAlonSiPa101D0525C1FT3umR1 Spin Coaters Note Designed for all brand

Note Designed for all brand low speed saw with  1/2" arbor

It can seal air-sensitive samples inside the glovebox and transport the sample to the outside glovebox through an antechamber or seals the sample from the outside glovebox by vacuum pump to put it into the glovebox through the antechamber air chamber

Big Antechamber Sealing O-ring for VGB-6 Glove Box

Part Number EQ-AL0605 Arbor Dia 0

Aluminum Film on Silicon Wafer, 3 microns / 4" -- Al-Si-100-3um, Si(100) N-type, R:1-20 ohm.cm - FmAlonSiPa101D0525C1FT3umR1 Spin Coaters Note Designed for all brandAluminum Metallic Film Film coated by E beam evaporation under vacuum below 10 6 torr evaporation rate: 0. 2 nanometer per second Aluminum Thickness: 3 microns Film Resistivity: 2. 65 micro ohm cm Film Crystallinity: Weak (111) oriented polycrystals Roughness, RMS: 4. 87 nm and < 10 nm Silicon Wafer Specifications: Conductive type: Si n type Resistivity: 1 10 ohm cm Size: 4" diameter + 0. 5 mm x 0. 525 + 0. 025 mm th Orientation: (100) + 0. 5o Polish: