GaN ,N-type ,Si doped (0001) 10x10.5x0.35mm,1sp- Ga-face polished Max. current +1 mA 3/8" OD larger diameter Alumina

3/8" OD larger diameter Alumina tube is made by high purity 99

Density > 3

Resistivity : (0

Density:             3

GaN ,N-type ,Si doped (0001) 10x10.5x0.35mm,1sp- Ga-face polished Max. current +1 mA 3/8" OD larger diameter AluminaGaN single crystal substrates is made by a hydride vapor phase epitaxy (HVPE) based method. During the HVPE process, HCl reacts with molten Ga to form GaCl, which in turn reacts with NH3 to form GaN. The large growth rate enables the growth of self supporting wafer thicknesses in a convenient time period. Specifications of the Substrate Orientation: c axis (0001) + 1. 0 o Nominal Thickness 350+ 25 microns Dimension: 10 mm x 10. 5 mm + 0. 5 mm Bow